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場發射式電子顯微鏡用高解析鍍金機

High Resolution Sputter Coater

Illustrated:
sputter coater 208HR with
rotary-planetary-tilt stage
thickness controller MTM-20
Features:
 
Wide Choice of Coating Materials:
  Magnetron head design and effective gas
  handling allow a wide choice of
  targetmaterials (see specification)
  Precision Thickness Control:
  Thickness optimized to the FE-SEM
  operating voltage using the MTM-20
  highresolution thickness controller
  Multiple Sample Stage Movements:
  Separate rotary, planetary and tilting
  movements allow optimized coating
  distributionand coverage. (view Rotary-Planetary-Tilt Stage )

 
Variable Chamber Geometry:
  Chamber geometry is used to adjust
  deposition rates from 1.0 nm/sec
  to 0.002nm/sec to optimize structure
  Wide Range of Operating Pressures:
  Independent power/pressure adjustment
  allows operation at argon gas
  pressureranges of 0.2 - 0.005 mbar
  Compact Modern Benchtop Design:
  Space and energy saving design
  eliminates need for floor space, water,
  specializedelectrical connections
 

Coating Difficult Samples for the FE-SEM

The Cressington 208HR now offers real solutions to the problems encountered when coating difficult samples for FE-SEM. In order to minimize the effects of grain size the 208HR offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. To minimize charging effects the 208HR stage design and wide range of operating pressures allows precise control of the uniformity and conformity of the coating. The HIGH/LOW chamber configuration allows easy adjustment of working distance.
(Compare this picture with the top picture.)
   

Rotary-Planetary-Tilt Stage

場發射式電子顯微鏡用高解析鍍金機 真空鍍金機 鍍金機 High Resolution Sputter Coater
   
 
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update: 2017-10-19