返回首頁
 
[ 電子顯微鏡前處理設備 | T.E.M | CPD 408 Critical point Drying for MEMS ]

CPD 408 微機電系統臨界點乾燥機

 

CPD 408 專為較大,較平之試片,如微機電系統晶圓而設計。獨一無二的雙倍真空腔體系統確保最低二氧化碳消耗量。操作非常簡單,且全電腦自動控制。

特色:

安全且操作簡單

溫和的基材處理

體積小巧

操作經濟

極佳的可視性

■ CPD 408 Critical point Drying for MEMS

The CPD 408 has been developed for critical point drying of large, flat specimens e.g. wafers for MEMS. The unique double chamber system ensures a minimum consumption of CO2. The handling is very simple and the fully automatic process is computer controlled.

 

Feature:

Safe and easy operation

Gentle substrate treatment

Compact bench top unit

Economical operation

Excellent visual access

   
 
Copyright © 2004 Power Assist Instrument Scientific Corp. All Right Reserved 
update: 2020-03-27